Glaser Weil LLP is pleased to announce a significant trial win for its client KAIST IP US in a patent infringement lawsuit against defendants Samsung, Qualcomm and Global Foundries. On June 15, 2018, a jury in the Eastern District of Texas awarded KAIST IP US $400 million in patent infringement damages. The jury found all the defendants infringed and the claims to be valid. The jury also found that Samsung willfully infringed. The case involved fundamental semiconductor technology called a bulk FinFET.
KAIST IP US was represented by Glaser Weil, Irell & Manella and Parker Bunts & Ainsworth. The Glaser Weil team was led by Andrew Choung, Partner and Head of the Firm’s Patent and Technology Practice, and included Partner Rex Hwang and Associates Desmond Jui, Thomas P. Burke and Guy M. Rodgers.